Process and apparatus for chemical conversion

ABSTRACT

A process and reactor for chemical conversion is taught. The process allows the selective breaking of chemical bonds in a molecule by use of fast rise alternating current or fast rise pulsed direct current, each fast rise portion being selected to have a suitable voltage and frequency to break a selected chemical bond in a molecule. The reactor for carrying out such a process includes a chamber for containing the molecule and a generator for generating and applying the selected fast rise current.

FIELD OF THE INVENTION

This invention is directed to a process and apparatus for chemicalconversion and, in particular, a process and apparatus for selectivemolecular modification for manufacture or destruction of chemicals.

BACKGROUND OF THE INVENTION

Each chemical bond has a natural oscillating frequency at which theatoms move towards and away from each other. The natural oscillatingfrequency of a bond is constant at a given temperature and pressure andis dependent on the relative sizes of the bonded atoms, the geometry ofthe bonds, and the nature of adjacent bonds. Thus, a unique oscillatingfrequency is associated with each bond in a molecule, except wheregeometric symmetry exists. Where such symmetry exists, the symmetricalbonds have the same oscillating frequency.

SUMMARY OF THE INVENTION

A process and apparatus is provided for selectively breaking chemicalbonds using an alternating current or pulsed direct current dischargehaving a suitable high frequency component. The continued application ofa discharge at the suitable frequency will discourage the re-formationof the dissociated bond.

According to a broad aspect of the present invention there is provided aprocess for breaking a chemical bond in molecule comprising: applying tothe molecule a high voltage electrical discharge having a selectedactive high frequency component and at least sufficient amplitude tobreak the chemical bond.

According to a further broad aspect of the present invention there isprovided an apparatus for breaking a chemical bond in a molecule, themolecule being in a gas or vapour site comprising: a reactor having achamber for containing the molecule; and generator means for applying anelectrical discharge current through the chamber, the discharge currenthaving an active high frequency component which selectively breaks thechemical bond.

DESCRIPTION OF THE INVENTION

Chemical bond breaking is achieved by the use of a high frequency, highvoltage alternating current or pulsed direct current discharge which isselected to have a waveform having a fast rise leading edge suitable forselectively breaking a selected bond in a particular type of molecule.Where there is a mixture of gasses, there will be selective breakage ofthe particular bond in the particular type of molecular target.

The fast rise portion of the waveform creates a range of high frequencycomponents defined by the rate of change at each point on the slope inconjunction with the repetition rate (i.e. frequency) and the amplitudeof the waveform. The time that the leading edge of a waveform ismaintained at any given frequency combined with the voltage at thatpoint give a potential energy transfer rate. To break a selected bond ina molecule, the leading edge of the waveform is selected to have a highfrequency component which interferes with the bond, termed the “activefrequency” or “active high frequency component”. This active frequencyis applied at a suitable voltage and be maintained for a sufficient timeto transfer enough energy to the molecule to break the bond.

It is believed that the active high frequency component is close to aprimary or harmonic of the natural oscillating frequency of the selectedbond and therefore creates constructive interference with theoscillation of any of the bonds which are in phase with the highfrequency component. It is believed that suitable active frequencies areat least in the megahertz range. The active frequency is applied at asuitable voltage and is maintained for a sufficient time to transferenough energy to the molecule to break the bond. It is believed that thesuitable voltage is at least three times the combined strength of thebonds to be broken. It is further believed that an avalanche effect iscreated wherein further selected bonds are broken by those brokenthrough the application of the active frequency. In such an effect, therelease of bond energy causes the separated atoms to be high in energyand to collide with other molecules that have bonds weakened from theapplication of the current. Due to the collision, the weakened bonds arebroken. Since it is believed that the applied active frequency can be aharmonic of the natural oscillating frequency, it is believed that thereare many frequencies that are suitable for interference with any onebond. By “harmonic” in this disclosure it is meant not only integermultiples of the oscillating frequency of the bond, but also integerdivisions. Many bond frequencies ore of extremely high frequencies (inthe Gigahertz range), and integer divisions of the resonatingfrequencies are easier to achieve than integer multiples.

In a reactor it is believed that substantially only the selected bondsare broken by applying a current having an active high frequencycomponent and suitable voltage, since generally each bond in a moleculerequires a unique frequency and minimum voltage for breakage. Selectivebreakage occurs even where other molecular species are present. However,due to ionization in the reactor and the impact of high energy atoms,some other bonds may be broken as well.

In an embodiment, a periodic wave form is generated having a leadingedge selected to represent an active frequency for breaking a selectedbond and sufficient voltage to break the bond once it is applied. In acontinuous system, wherein molecules are being reacted and passed on,the flow rate of the molecules through the reactor must be consideredand the voltage should be increased accordingly, to expose each portionof the gas or vapour containing the molecules to sufficient voltage toinitiate bond breakage before the gas passes out of the reactor.

To carry out the process of the present invention, a current having afast rise and sufficient voltage is applied to the gas or vapour form ofa selected reactant. An active high frequency component for the bondwhich it is desired to break is determined and the waveform optimized byapplying the discharge current to the reactant and adjusting therepetition rate or amplitude of the waveform or the inductance orcapacitance of the circuit, transformer or reaction cell whilemonitoring the reaction by use of a means for chemical analysis, such asa mass spectrometer. In a preferred embodiment, the capacitance andinductance of the cell, circuit and transformer are maintained constantwhile the amplitude and repetition rate are adjusted to obtain thedesired active frequency. Once determined, these parameters can be usedfor future chemical conversion involving that selected bond atsubstantially similar conditions of temperature and pressure in thereactor. Any changes in the voltage or the repetition rate of theapplied discharge or changes in the inductance or capacitance of thecircuit, transformer or reactor cell including any changes reactor load,such as gas pressure, temperature, flow rate or composition, requirereoptimizeation of the waveform to re-establish the active highfrequency component. Such readjustment can be made manually or, in somecases, by use of a circuit feedback arrangement. In addition, inreactors produced for the same reaction and with similar geometry, thecircuit can be optimized once and incorporated into each further reactorwithout resetting.

The present process is also useful for selective breaking ofgeometrically symmetrical atomic bonds in a molecule by first selectingan active high frequency component for the first bond. Once that bondhas been broken, the removal of a further bond requires that a differentactive frequency be selected. Since, the natural oscillating frequencyof a bond is dependent upon bond geometry and the nature of adjacentatoms, it is believed that the breakage of the first of the symmetricalbonds is accomplished by applying current at the primary or harmonic ofthe bond so that constructive interference of the bond oscillationoccurs. Once this bond is broken, the oscillating frequency of theremaining symmetrical bonds changes and requires a different harmonic orprimary frequency for constructive interference. The process allowsgeometrically symmetrical atomic bonds in a molecule to be brokenindependently and in any desired number.

A reactor for chemical modification according to the invention isprovided comprising a cell for containing a gaseous or vaporised form ofmolecular species to be reacted, or a gas or vapour comprising at leasta portion of the molecular species to be reacted, and means for applyingto the cell a high frequency, high voltage alternating or pulsed directcurrent discharge within a plasma or corona discharge. The discharge isselected to have a high frequency component and amplitude which willselectively break a bond in a molecule. In one embodiment, the reactorcomprises means for applying to the cell a discharge comprising awaveform having a active frequency component.

In another embodiment a capacitive-inductive resonating circuit is usedto produce a carrier waveform having the required active frequency forthe chemical conversion. The circuit is powered by any suitable powersupply or source. The resultant waveform can be an alternating currentor a pulsed direct current having an active frequency component. In apreferred embodiment, the current is an alternating current dischargehaving an active frequency component and is preferably generated andmaintained, by an electronic circuit employing a saturable transformerhaving a feedback winding. The high frequency component is produced by“switching on” a transistor until the core of the transformer ismagnetically saturated, as determined by the feedback winding orwindings and the reaction cell. The “switch on” initiates oscillation atthe circuit resonance frequency and once initiated the energy from thecore of the transformer maintains the reaction. In an alternatepreferred embodiment, the current is a high voltage direct currentdischarge having the active high frequency component added thereto.

In the preferred embodiment, the reactor cell acts as the capacitance ina parallel resonant circuit with the secondary winding of thetransformer forming the inductor. The capacitive and inductivecharacteristics of the cell and inductor are chosen such that thecircuit is essentially resistive at the resonant, active frequency.Energy transfer produces some heat and causes chemical modification byinterfering with and breaking a specific bond of a molecule. Alteringthe capacitance or inductance of the reactor and the repetition rate andamplitude of the applied waveform provides two means of selecting whichbonds are to be broken.

Since the presence of gas or vapour alters the capacitance of theresonant circuit, the electronic circuit of the present invention iscapable of compensating for changes in the reactor loading such as thegas flow rate, gas density, gas composition or gas temperature bysensing the changes in the dielectric constant of the gas. Changes inthe dielectric constant of the gas cause the current of the discharge inthe reactor to change, and hence the feedback winding changes theoperating parameters to maintain the required active frequency forspecific chemical modification.

In an embodiment, an energy efficient reactor is provided wherein thetransformer and electronics are impedance matched to the reactorcircuit. Impedance matching in the reactor circuit can be provided bymodifying the electrode geometry such as, for example, by winding aselected number of turns of a conductive element, such as wire, incommunication with the high voltage or ground electrodes, by forming thehigh voltage electrode as a spiral having a predetermined pitch andlength or by separating the electrodes by a selected distance.

In another embodiment, node reflection and wave form destruction in thereactor is minimized by, for example, selection of length of the highvoltage electrode and reactor length to prevent reflection of the waveand destructive interference thereof.

The apparatus of the present invention can be used in series with aplurality of heat exchangers of sequentially reducing temperatures whichselectively condense, and thereby separate, various constituents of thefluid after treatment. It is preferred that a flowing stream of fluid befed to the reactor such that a continuous process for chemicalmodification is provided. Since the application of current at the activefrequency will discourage the reformation of selected bonds, thisprocess can be used in combination with other reactors wherein streamsof modified products can be caused to converge to react togetherchemically to create reaction products. Any reactor must be built havingregard to the corrosion problems of the fluid to be introduced andformed in the reactor.

To increase the output of reaction products by the reactor, the lengthof the reactor can be extended or a plurality of reaction cells can beused in series or parallel. In such arrangements, an electrical controlcan be provided to detect malfunction in any portion of the reactor andcause the reactor to be shut down.

Since, the molecular species to be reacted must be in a gas or vapourstate, in an embodiment the reactor is constructed so as to be capableof vaporizing a liquid therein by application of heat or modification ofinternal pressure.

BRIEF DESCRIPTION OF THE DRAWINGS

A further, detailed, description of the invention, briefly describedabove, will follow by reference to the following drawings of specificembodiments of the invention, which depict only typical embodiments ofthe invention and are therefore not to be considered limiting of itsscope. In the drawings:

FIG. 1 shows a waveform useful in the present invention;

FIG. 2 shows a circuit diagram of an electronic circuit useful in thepresent invention for generating the waveform of FIG. 1;

FIG. 3 shows a side sectional view of a reactor useful in the presentinvention;

FIG. 4 shows an exploded, partially cut away view of a reactor useful inthe present invention;

FIG. 5 shows a sectional view of a chemical reactor useful in thepresent invention;

FIG. 6 shows a schematic diagram of a reactor system according to thepresent invention;

FIG. 7 shows an oscilloscope representation of a waveform useful in theproduction of ozone from oxygen according to the present invention;

FIGS. 8A and 8B show oscilloscope representations of waveforms useful inthe production of ozone from oxygen according to the present invention;and,

FIGS. 9A and 9B show oscilloscope representations of waveforms useful inthe debromination of halon 1301 according to the present invention.

DETAILED DESCRIPTION OF THE INVENTION

Referring to FIG. 1 of the drawings, a carrier waveform 200 is shown.The slope of the leading edge of the waveform shown between A and Bcreates a range of high frequency components. These frequencies arecreated by the rate of change at each point on the slope in conjunctionwith the repetition rate and the amplitude of the waveform. The timethat the waveform remains at any given frequency combined with thevoltage gives a potential energy transfer rate. While the actual slopeor rate of increase between A and B will vary (unless adjusted) with therepetition rate of the entire waveform (i.e. the interval between C andD), it is the slope between A and B and not the repetition rate that isthe significant factor in the chemical conversion. The repetition rateof the waveform determines how often the active frequency component isdeveloped.

The various points between A and B provide a series of high frequencycomponents. The slope of the leading edge of the waveform can beadjusted to select the active frequency for the breakage of a selectedbond. This frequency must be delivered at a sufficient voltage to breakthe desired bond. Therefore, the slope should adjusted so that theactive frequency is delivered at a sufficient voltage to deliver enoughenergy to break the bond. When the active frequency is determined for aselected bond the slope between A and B is then flattened out to tune inon that active frequency to optimize the reaction.

Referring to FIG. 2 of the drawings, the preferred circuit forgenerating the waveform shown in FIG. 1 is shown. The circuit comprisesa Darlington pair transistor T1 and a ferrite core transformer TR1. Thetransformer TR1 has four windings, the primary winding 300, a secondary(output) winding 310, and two feedback windings 320 and 330. The primarywinding 300 connects the collector of the transistor T1 to the positivepower supply voltage. The secondary winding 310 is the output of thereactor circuit and is applied to one of the electrodes of the reactorcell shown in FIG. 3. The feedback winding 320 is connected via diode D4and R3 to the base of the transistor T1. The other terminal of thefeedback winding 320 is connected to the biasing circuit of thetransistor T1, which comprises variable resistor VR1, resistor R1 andresistor R2, as well as silicon switching diodes D1, D2 and D3. Thefeedback winding 330 connects the emitter of the transistor T1 to thenegative terminal of the power supply. The circuit operates as follows.

Transistor T1 is present to permit generation of a fast rise waveform.In a circuit which is intended to produce pulsed DC waveforms, onetransistor T1 is used. If it is desired to produce AC waveforms, asecond transistor (not shown) is used. As the transistor T1 is handlinga high peak current, a heat sink to dissipate the heat generated by suchcurrent should be used.

Transformer TR1 is a saturable transformer having a ferrite corematerial with very low losses. In a preferred embodiment, TR1 has aferrite core comprising a 7 turn primary winding 300, a 3 turn feedbackwinding 320, a 1 turn feedback winding 330 and a secondary winding 310having 3300 turns; all of 22 gage wire.

The diodes D1, D2, D3, and D4 are silicon switching diodes that areselected to have voltage and temperature characteristics whichcorrespond the Darlington transistor. Diodes D1, D2, and D3 give aregulated “switch on” voltage for transistor T1. Diode D4 acts toprevent the negative feedback voltage turning the base-emitter junctionof transistor T1 back “on” by reverse voltage avalanche breakdown. Anysimilar silicon switching diode to IN914 can be used for diodes D1, D2,D3, and D4.

Variable resistor VR1 and fixed resistor R1 regulate the current tomaintain the voltage across the diodes and bias the base of thetransistor T1. Variable resistor VR1 is used to set the operatingcurrent, compensating for different gain of transistors. Resistor R1acts to limit the current when variable resistor VR1 is set to 0.Alternatively, a fixed value resistor of suitable resistance for thetransistor used, can replace both R1 and VR1.

Feedback winding 330 is connected to the emitter of the transistor. Itprovides compensation for change of gain versus temperature, andprovides some compensation for transistors of different gain. Winding330 is most useful in high power reactors. However, since it also actsto damp harmonics in the system, which would interfere with the desiredactive frequency, it is preferably included in all circuits.

Capacitor C1 reduces variations in the supply voltage reaching the baseof transistor T1 during normal operation. This is important in highcurrent reactors. Due to the high switching current, smoothingcapacitors C1 and C2 must each handle high peak ripple currents and mustbe rated accordingly.

Power is applied to the circuit by an AC source as shown. The currentwithin the circuit is preferably 12 volt DC. Therefore where 120 voltpower is used a step down transformer is required prior to the bridgerectifier BR1. The bridge rectifier is useful even where the powersupply is a battery, since the rectification allows connection of thebattery without concern as to matching terminals.

After power is applied to the circuit, the base of transistor T1 isdriven positive and the collector current increases. For the purposes ofthis description, it is assumed that the circuit has been operating forsome time and that we are starting the description from the point wherethe base of transistor T1 is being driven positive and the collectorcurrent is increasing.

With transistor T1 fully switched on, the current through the primarywinding of TR1 transformer increases at a rate set by the transformerinductance and the reactor capacitance. As the current increases, thetransformer core magnetizes, and a voltage is induced into the basefeedback winding 320. The negative going end of feedback winding 320 isconnected to the voltage reference diodes D1, D2, D3 and the positivegoing end connected through diode D4 to resistor R2 and the base oftransistor T1. Thus, an induced voltage in feedback winding 320 acts tomaintain transistor T1 “on”. The actual drive current is set by thevalue of the resistors VR1 and R1.

Resistor R3 together with the base input capacitance of transistor T1reduces current oscillation at very high frequency during switching.Preferably, resistor R3 is connected directly at the base of transistorT1.

As the transformer core approaches saturation, the rate of currentincrease drops. As it drops, the induced voltage in the base feedbackwinding reduces thus reducing the drive to the transistor which thenstarts to turn off. This reduces the rate of increase of the collectorcurrent through primary winding 300 and this in turn further and furtherreduces the feedback voltage. This very rapidly turns the transistorfully off. As the core magnetic field is no longer being maintained bythe transistor, the magnetic field collapses reversing the voltage inthe base feedback winding 320 and placing a negative voltage on theanode of diode D1 turning it off thus keeping transistor T1 turned off.This also effectively unloads the feedback winding 320 and prevents anydamping of the now oscillating secondary winding 310.

As the current drops towards zero across the base feedback winding 320,the generated negative voltage across the base feedback winding 320decreases until it no longer cancels the bias voltage at the cathode ofdiode D1. When this happens, the transistor starts to turn on. As itdoes, the current starts increasing and this in turn reverses thevoltage in the base feedback winding 320. This applies additionalpositive voltage to the base of transistor T1 turning it fully on andinto full saturation. Now the transistor is turned fully on and thecollector current increases, which is where the cycle repeats.

Referring to FIG. 3, a reactor 10 is shown which is useful in theselective breaking of an atomic bond within the molecules of a fluid.Reactor 10 comprises a first electrode 12 and a second electrode 14. Asheet of dielectric material 20 is mounted on electrode 14 on a sideproximate electrode 12. Electrodes 12, 14 are electrically connected tothe output of the circuit of FIG. 2. Thus, a waveform generally as shownin FIG. 1 is applied between electrodes 12 and 14, causing plasmadischarge through gap 18. A gas or vapour comprised of at least aportion of a molecular species to be modified introduced to reactor 10and is present in gap 18.

The gas or vapour to be modified preferably passes in a continuousstream through gap 18, as indicated by the arrows, between inlet 21 andoutlet 22. The parameters of the applied current are optimized byanalyzing fluid exiting through outlet 22 by use of chemical analyzers,such as a mass spectrometer, and adjusting the tuned circuit to changethe shape of the waveform slightly until output is optimized. Theapplication of energy at the active frequency acts to break selectedbonds in the reactant by interfering with the selected bond. Such areaction produces heat which passes through electrodes to the exteriorof the reactor.

Referring to FIG. 4, a preferred reactor for carrying out the presentprocess is shown. The reactor comprises an apparatus 23 for producing aperiodic waveform having an active frequency, a reaction chamber 24 anda heat sink arrangement 26 associated with apparatus 23 and reactionchamber 24.

Reaction chamber 24 comprises ground electrodes 33 and 34 havingcorresponding grooves formed therein for accommodating and contactingdielectric tubular member 36. Electrodes 33, 34 are secured about member36 by pop rivets 38 and 40.

Disposed within member 36 is high voltage spiral electrode 42 consistingof corrosion resistant metal, having regard to the fluid to be reacted,or likewise corrosion resistant semiconductive material. The pitch andlength of electrode 42 is selected to impedance match the impedance ofapparatus 23. In addition, the length of electrode 42 is selected toprevent node reflection of the required waveform. A screw 43 formed of asuitable dielectric material is inserted through an aperture 45 formedin end block 60 to be in engagement with an end 52 of electrode 42 bythe resiliency formed in the electrode. Screw 43 allows externaladjustment of the length of electrode 42 by compressing or allowingextension of electrode 42. A dielectric member 44 acts as a filler andsupport for spiral electrode 42. An end portion 46 of spiral electrode42 is inserted into central aperture 48 of centering triangle 50. Theother end 62 of spiral electrode 42 is inserted into central aperture 54of centering triangle 56. Tubular dielectric member 36 containing spiralelectrode 42 and associated parts 44, 50, 56 is inserted betweenapertures 66, 68 of end blocks 58 and 60, formed of suitable dielectricmaterial, respectively. Sealing means, such as O-rings 62, 64 areprovided to seal the connection between tubular member 36 and the endblocks against passage of gas. A high voltage pin 70 is inserted intoaperture 48 of centering block 50 to be in electrical communication withend 46 of spiral electrode 42.

A current collector 72 formed as a tubular member from corrosionresistant metal is sealably secured such as by press fitting at its endsinto apertures 74 and 76 of end block 58 and 60, respectively. Currentcollector 72 acts mechanically to join and form a gas tight channelbetween end blocks 58 and 60. Electrodes 33 and 34 accommodate and makecontact with current collector 72. Since electrodes 33 and 34 are atground potential during operation and are in intimate contact withcurrent collector 72, current collector 72 serves to prevent electricalcurrent from passing out of the reaction chamber should any conductivefluid back up into the reaction chamber and come in contact withelectrode 42 during use.

A stream of gas or vapour containing at least a portion of molecularspecies to be reacted is provided to the reactor through entry nozzle 78into an upper chamber of block 60. The gas is directed into and passesthrough dielectric tubular member 36 and about spiral electrode 42 intoend block 58. Dielectric member 44 acts within dielectric member 36 todirect the fluid into close association with spiral electrode. Thespiral configuration, in addition to providing impedance in the reactor,acts to create turbulence in the passing fluid stream and therebyenhance mixing and heat transfer to electrodes 33, 34. Fluid returnsalong the bore of current collector 72 to enter a lower chamber of block60 where an outlet is provided from the reactor. Fluid passing throughthis system is modified when passing through dielectric tubular member36 by application of a selected active frequency current applied throughelectrode 42. Current is provided to electrode 42 by apparatus forproducing current 23.

To allow formation of a vacuum within the gas flow path, and therebyvaporization of liquids within the reactor, the chamber is substantiallyairtight.

Apparatus for producing current 23 is comprised of a circuit asgenerally described in reference to FIG. 2 including among itscomponents a high voltage transformer 80, a low voltage transformer 82,a bridge rectifier 88, a switch 109, transistor 90 and associatedelectronics 88. The low voltage transformer 82 is provided withfluctuating power such as alternating current by means of plug 84. Thecurrent produced by apparatus 23 is communicated to the reactor througha high voltage wire 96 having a plug 98 on an end thereof for makingcontact with high voltage pin 70 in end block 58. Switch 109 issensitive to pressure and interrupts the power flowing from thetransformer 82 to the electronics 88 when end block 58 is moved fromplug 98.

When the high frequency, high voltage current is applied to the fluid inthe reactor, heat is generated. A heat sink 26 is provided inassociation with reaction chamber 24 to dissipate heat generated in thereactor. Heat sink 26 comprises a thermally conductive tube 121, forconducting a suitable coolant, which is inserted into a heat sink block122. Holes in the heat sink block 122 include a threaded hole 123 tomount the transistor 90 and a threaded hole 125 to mount the bridgerectifier 86. Heat sink block 122 is firmly mounted to ground electrodes33 and 34 through conductive screws 126 which also act to groundelectrodes 33 and 34.

Referring to FIG. 5 there is shown a chemical reactor 500 comprising tworeaction cells 510, 512, of the present invention, in parallel, andproviding output streams of reaction products into a reaction chamber514 where the chemicals are allowed to combine and react. Reactionproducts are passed out of reaction chamber 514 via port 516. Highvoltage electrodes 518, 520 extend into the reaction chamber such thatthe application of current can be maintained to discourage reformationof dissociated chemical bonds. Within chamber 514 high voltageelectrodes are spaced apart a distance greater than the voltagedifferential of the electrodes.

As shown schematically in FIG. 6, the output of reaction products by thepresent reactor can be increased by providing a reactor systemcomprising a plurality of reaction chambers 724 a, 724 b and 724 c inseries. Problems in scale-up, such as reconfiguration of enlargedreactors, are thus avoided by installing optimized reactors in greaternumbers. To control the passage of untreated gas through the system, incase of system failure, valves 799 a, 799 b and 799 c are provided atthe outlet of each chamber so that gas can flow from chamber 724 cthrough chamber 724 b and then though chamber 724 a. These valves areheld open in normal operation by power supplied via line 797, which isin series with the apparatus 723 for producing current. Where the systemfails, such as by dielectric breakdown, a current-sensitive protectivedevice 795, such as a fuse or circuit breaker, in the power supply 793senses the increase in current flow and stops power to the system.Valves 799 a, 799 b, and 799 c then stop the flow of gas through thechambers 724 a, 724 b and 724 c until the flow of current is resumed,thereby preventing output of any unreacted gas through the system.

The invention will be further illustrated by the following examples.While the examples illustrate the invention, they are not intended tolimit its scope.

EXAMPLE 1

Air at atmospheric pressure and 26° C. was dehumidified so that it had adew point between 35° and 40° F. The air was introduced to a reactorgenerally as described in reference to FIG. 4 at a flow rate of 3l/minute. Air exiting the reactor was passed to an ozone monitor foranalysis.

To the air was applied electrical discharges as follows:

-   -   1. A sinusoidal waveform having a frequency of 60 Hz and varied        between 5,000 and 8,000 volts;    -   2. A sinusoidal waveform having a frequency of 6.5 kHz and        ranging between 5,000 and 8,000 volts;    -   3. A square waveform having a frequency of 6.5 kHz and ranging        between 5,000 and 8,000 volts; or,    -   4. A waveform according to FIG. 7 having a repetition rate of        6.67 kHz and an amplitude of 4,500 volts. From the oscilloscope,        calculations of the slope of the substantially straight portion        of the leading edge between A and B indicate that the rate of        voltage rise is in the order of 6.6×10⁶ volts/second.

Typical ozone production results by use of waveforms 1 to 4 fortreatment of air are summarized in Table 1. TABLE 1 Ozone concentrationWaveform (% by weight) 1 0.001 2 0.086 3 0.066 4 0.332

EXAMPLE 2

Halon 1301 (CF₃Br) at 2.5 psi and 20° C. was introduced to a reactor,generally as described in reference to FIG. 4 at a flow rate of 3l/minute. Reactor out put was analyzed by observing the gas colorationand odour for production of bromine gas. In addition, reacted gas waspassed to a mass spectrometer for halon conversion analysis.

To the halon 1301 was applied electrical discharges as follows:

-   -   1. A sinusoidal waveform having a frequency of 60 Hz and varied        between 12,000 and 15,000 volts;    -   2. A range of sinusoidal waveforms having frequencies ranging        between 5,000 and 7,000 Hz and amplitudes ranging between 5,000        and 8,000 volts;    -   3. A range of square waveforms having frequencies ranging        between 5,000 and 7,000 Hz and amplitudes ranging between 5,000        and 8,000 volts; or,    -   4. A waveform according to FIG. 1 having a repetition rate        ranging between 5,000 and 7,000 Hz and an amplitude of between        about 4,500 and 5,000 volts.

Typical halon conversion results by use of waveforms 1 to 4 aresummarized in Table 2. TABLE 2 Waveform Reacted gas colour Halonconversion (%) 1 colourless trace 2 fight brown trace 3 Oglit browntrace 4 strong, reddish brown 12%

It was determined that the reaction by use of a fast rise waveformaccording to the process of the present invention resulted in theconversion as follows:CF₃Br→C₂F₆+Br₂at a rate of 12%. Only trace conversion of halon was obtained by use ofthe sinusoidal and square waveforms.

Similar halon conversion results were obtained using Halon 1211,(CF₂COBr).

EXAMPLE 3

Air at atmospheric pressure and 22° C. and having a relative humidity of80% was introduced at a flow rate of 3.8 l/min to reactors, generally asdescribed in reference to FIG. 4 without the use of a heat sink andhaving the parameters as set out in Table 3. TABLE 3 Reactor A Reactor BLength 12 inch 4 inch Capacitance 147 pF 34 pF (at frequency = 0)Resonance 58.2 Mhz 66.0 Mhz Inductance 0.0508 uH 0.170 uHThe measurements for the reaction chambers were carried out in 18° C.,atmospheric pressure and 70% RH using a MIC37 multimeter and a MFJHF/VHF SWR analyzer, to measure capacitance and resonance, respectively.Inductance was calculated for the system.

The waveforms were monitored using a Phillips PM3365A 100 MHzOscilloscope set at 5 VDC and 0.1 ms connected to a Techtronix P60151000× probe. Air exiting the reactor was passed to an ozone monitor foranalysis.

The waveforms which were found to produce optimum amounts of ozone forreactor A and reactor B are shown. In FIGS. 8A and 8B, respectively. Thewaveform parameters and ozone production results are shown in Table 4.TABLE 4 Reactor A Reactor B Repetition rate (Hz) 1603 1637 Voltage (kV)20 22 Leading edge rate of 234 × 10⁶ 233.5 × 10⁶ voltage increase (V/s)Ozone concentration 0.190 0.145 (% by weight)*determined from oscilloscope

The active frequency for ozone production is uniform for gas having thesame flow rate, temperature and pressure regardless of the reactorparameters. The active frequency can be determined for each reactor byadjusting the amplitude and repetition rate of the waveform.

EXAMPLE 4

Using reactors A and B, halon 1301 at atmospheric pressure and 22° C.was introduced to each reactor at a flow rate of 4.5 l/minute. Theleading edge of the applied current discharge was monitored using anoscilloscope, as described in Example 3 and was tuned to optimizedebromination of the halon as determined by observing the reacted gascoloration and odour for production of bromine gas.

The waveforms which were found to produce a gas having a dark reddishbrown output gas and strong odour for reactor A and reactor B are shownin FIG. 9A and 9B, respectively. The waveform parameters are shown inTable 5. TABLE 5 Reactor A Reactor B Repetition rate (Hz) 2088 2012Voltage (kV) 25 25 Leading edge rate of 384.6 × 10⁶ 386.0 × 10⁶ voltageincrease (V/s)**determined from oscilloscope

EXAMPLE 5

Air at atmospheric pressure and 22° C. and having a relative humidity of80% was introduced at a flow rate of 3.8 l/min to reactor A as describedin Example 3. The waveform was monitored using a Phillips PM3365A 100MHz Oscilloscope set at 5 VDC and 0.1 ms connected to a Techtronix P60151000× probe. Air exiting the reactor was passed to an ozone monitor foranalysis.

The waveform was changed from waveform 1, having a slower rate ofvoltage increase than the waveform of FIG. 8A, to waveform 2, accordingto FIG. 8A, by adjusting the power to the reactor. Results are shown inTable 5. TABLE 6 Ozone Concentration Waveform (% by weight) 1 0.021 20.190

It will be apparent that many other changes may be made to theillustrative embodiments, while falling within the scope of theinvention and it is intended that all such changes be covered by theclaims appended hereto.

1. A process for breaking a chemical bond in a molecule comprising:applying to the molecule a high voltage electrical discharge having aselected active high frequency component and at least sufficientamplitude to break the chemical bond.
 2. The process of claim 1 whereinthe frequency is substantially a primary or harmonic of the naturaloscillating frequency of the chemical bond.
 3. The process of claim 1wherein the electrical discharge is an alternating current or a pulseddirect current.
 4. The process of claim 3 wherein the current isgenerated by a resonating circuit and the high frequency component iscreated by the capacitance and inductance of the reactor.
 5. The processof claim 1 wherein the molecule is oxygen.
 6. The process of claim 1wherein the molecule is selected from the group comprising CF₃Br,CF₂BrCl, C₂F₄Br₂ and CF₂COBr.
 7. The process of claim 1 wherein themolecule is a polychlorinated biphenyl.
 8. An apparatus for breaking achemical bond in a molecule, the molecule being in a gas or vapour statecomprising: a chamber for containing the molecule having two separateelectrodes; and electrical signal generator means for applying aperiodic waveform between the electrodes, the waveform having an activehigh frequency component and amplitude to selectively break the chemicalbond.
 9. The apparatus of claim 8 wherein the periodic waveform is analternating current or a pulsed direct current.
 10. The apparatus ofclaim 9 wherein the waveform comprises a high frequency componentselected to be substantially a primary or harmonic of bond's naturaloscillating frequency.
 11. The apparatus of claim 8 wherein theelectrical signal generating means utilizes the chamber as a reactivecomponent of its resonating circuit.
 12. The apparatus of claim 11wherein the resonating circuit comprises a feedback to compensate forchanges in the gas or vapour dielectric constant.
 13. The apparatus ofclaim 11 wherein the circuit comprises a transistor having a feedbackwinding in its emitter.
 14. The apparatus of claim 8 wherein the twoseparate electrodes form a capacitive component of a resonant circuit insaid electrical signal generator means, the inductive component of whichis an output transformer for applying the periodic waveform across thetwo separate electrodes.
 15. The apparatus of claim 11 wherein theresonating circuit is impedance matched to the reactor.
 16. Theapparatus of claim 8 wherein the apparatus is mounted in parallel withfurther substantially similar apparatus, each being connected to acommon output chamber for combination of modified chemicals.
 17. Theapparatus of claim 8 formed to allow heating thereof.
 18. The apparatusof claim 8 formed to allow changes in the pressure within the chamber.19. An apparatus for breaking a chemical bond in a molecule, themolecule being in a gas or vapour state, the apparatus comprising: achamber for containing the molecule having two separate electrodes towhich is applied a periodic waveform having a fast rising leading edgeand having a suitable voltage to at least partially thereby ionize themolecule to break the chemical bond.
 20. The apparatus as claimed inclaim 19 wherein the fast rising leading edge includes a portion havinga constant slope.
 21. The apparatus as claimed in claim 19 wherein thesuitable voltage includes a range of voltages having an adjustablevoltage increase rate.
 22. The apparatus as claimed in claim 21 whereinthe voltage increase rate of the fast rising leading edge is adjusted tooptimize the break down of the chemical bond.
 23. The apparatus asclaimed in claim 22 wherein the voltage increase rate of the fast risingleading edge is substantially equal to 6.6×10⁶ volts/second, to therebyproduce ozone gas from air.
 24. The apparatus as claimed in claim 22wherein the voltage increase rate of the fast rising leading edge issubstantially equal to 234×10⁶ volts/second, to thereby produce ozonegas from air.
 25. The apparatus as claimed in claim 22 wherein thevoltage increase rate of the fast rising leading edge is substantiallyequal to 233.5×10⁶ volts/second, to thereby produce ozone gas from air.26. The apparatus as claimed in claim 22 wherein the voltage increaserate of the fast rising leading edge is substantially equal to 384.6×10⁶volts/second, to thereby produce bromine gas from Halon 1301 (CF₃Br).27. The apparatus as claimed in claim 22 wherein the voltage increaserate of the fast rising leading edge is substantially equal to 386×10⁶volts/second, to thereby produce bromine gas from Halon 1301 (CF₃Br).28. The apparatus as claimed in claim 19 wherein the molecule is oxygenand at least a portion of the oxygen is ionized in the chamber to formionized oxygen, at least a portion of the ionized oxygen recombines toform ozone and the apparatus further comprises an outlet in fluidcommunication with the chamber for receiving the ozone.